TOC UV Degradation System

185 nm + 254 nm Ultrapure Water UV

≤0.5 μg/L
TOC: 185 + 254 nm
Wavelengths: 0.5–20 m³/h
Capacity

Dual-wavelength 185 nm + 254 nm UV for TOC degradation and microbial control in ultrapure-water loops. The system is typically installed after EDI or a polishing mixed bed, with selected configurations targeting TOC ≤0.5 μg/L and flow of 0.5–20 m³/h.

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KONCHE TOC UV degradation system with 185 nm and 254 nm lamps for ultrapure water loops

KONCHEINDUSTRIAL WATER TREATMENT SYSTEMSMODEL KONCHE TOC · TOC UV DEGRADATIONPHOTOLYSISUPW LOOPMICRO CONTROLENGINEERED BY KONCHE · 2026

QUICK TECHNICAL ANSWER

What is a TOC UV Degradation System?

KONCHE TOC UV systems: the 185 nm polishing stage that photo-oxidizes organics into CO₂ and water — the end-of-train guarantee of ≤0.5 μg/L TOC at 0.5–20 m³/h.

What it delivers

Outlet TOC ≤0.5 μg/L from feed water up to 50 μg/L
Dual-wavelength duty: 185 nm destroys TOC while 254 nm sterilizes simultaneously
Compact in-line 316L body — retrofittable to new and existing recirculating loops

Why trust KONCHE

Nearly 30 years matching TOC-UV stages inside ultrapure-water trains
Imported synthetic-quartz lamps, 8,000–10,000 h life with high 185 nm transmission
Ionized by-products captured by the downstream polishing bed — sizing verified against your water report

Where we stand out

What matters to you	How KONCHE delivers
One lamp, two duties	185 nm TOC destruction plus 254 nm sterilization in one chamber
Thorough degradation	≤0.5 μg/L output from ≤50 μg/L feed
Retrofit-friendly	Compact in-line 316L body fits new and existing systems
Proven sizing	Selected against loop TOC, temperature and contact time

PRODUCT DOCUMENTATION

KONCHE TOC systems use 185+254 nm dual-wavelength lamps in 316L electropolished chambers with synthetic-quartz sleeves. Capacities span 0.5–20 m³/h with lamp life 8,000–10,000 h; the unit installs after EDI, before or after the polishing mixed bed. Typical projects: semiconductor wafer rinsing, PCB/FPC cleaning, pharmaceutical purified water, optoelectronic panels and laboratory ICP-MS/HPLC water.

PROCESS POSITION

TOC UV WORKING PRINCIPLE — 185 nm photolysis generates hydroxyl radicals (·OH) that oxidize trace organics into removable species, while 254 nm output provides microbial inactivation; installed after EDI or the polishing mixed bed.

The 185 nm wavelength generates hydroxyl radicals that oxidize organic compounds. The 254 nm wavelength provides microbial inactivation. Together they reduce organic load and protect high-purity water quality.

CORE BENEFITS

Advantage	Customer benefit
Dual-wavelength design	TOC degradation and sterilization in one unit.
Thorough degradation	Outlet TOC ≤0.5 μg/L with feed water up to 50 μg/L.
Imported lamps	Synthetic-quartz lamps with 8,000–10,000 h life and high 185 nm transmission.
Compact in-line body	316L chamber retrofittable to new and existing systems.
Deep application experience	Nearly 30 years of ultrapure-water train engineering for accurate selection.

TECHNICAL DATA

Parameter	Value
Wavelength	185 nm
Flow	0.5–20 m³/h
TOC target	≤0.5 μg/L in selected configurations
TOC removal	Typically 50–60 , dependent on feed water %
Pressure	≤0.6 MPa
Chamber	316L stainless steel
Lamp life	8,000–10,000 hours
Power range	Approximately 40–960 W

MODEL RANGE

Model	Capacity	Lamp power	TOC removal
KC-TOC-05	0.5 m³/h	40 W	≥50%
KC-TOC-1	1 m³/h	80 W	≥50%
KC-TOC-2	2 m³/h	120 W	≥55%
KC-TOC-5	5 m³/h	240 W	≥55%
KC-TOC-10	10 m³/h	480 W	≥60%
KC-TOC-20	20 m³/h	960 W	≥60%

Note: removal depends on feed TOC, water temperature and contact time.

APPLICATIONS

Industry	Water point	System value
Semiconductors	Wafer rinsing, end-of-loop	TOC ≤1 μg/L (EP grade) at the point of use.
PCB / FPC	Final rinsing water	TOC ≤5 μg/L for cleaning quality.
Pharmaceuticals	Purified water / WFI loops	Meets pharmacopoeia TOC with margin.
Optoelectronics	TFT-LCD / OLED panel cleaning	TOC ≤5 μg/L for panel yield.
Laboratories	ICP-MS / HPLC feed	Type I water with TOC ≤10 μg/L.

MAINTENANCE

Item	Cycle	Maintenance
UV lamp	8,000–10,000 operating hours	Replace according to operating hours and UV-intensity trend.
Quartz sleeve	Every 3 months	Inspect and clean to maintain transmission.
Quartz replacement	Every 2–3 years	Replace when transmission or surface condition cannot be restored.
TOC / intensity sensor	Continuous	Verify reading and alarm response.
Seals	Annually	Inspect and replace aged seals during preventive service.

FAQ

Why are two wavelengths used?

185 nm supports organic oxidation while 254 nm supports microbial inactivation.

Where is TOC UV installed?

It is normally installed after EDI or a polishing mixed bed, close to the ultrapure-water storage or distribution loop.

What TOC can be achieved?

Selected configurations target ≤0.5 μg/L. Actual performance depends on feed-water TOC, flow, UV transmittance, lamp condition and system design.

How is lamp life managed?

Track operating hours and UV intensity, clean quartz regularly and replace the lamp when intensity or operating hours reach the maintenance limit.

WHY KONCHE

Nearly 30 years of expertise

Since 1997, Konche has engineered ultrapure-water polishing trains — TOC-UV stages sized against loop TOC load, lamp transmission and contact time.

Professional customization

Each system is designed around the water analysis, industry standard, site condition, capacity and final use.

Controlled system quality

Component selection, factory testing, water-quality verification and process control are managed as one complete system.

Full-cycle technical service

KONCHE supports proposal alignment, technical documentation, consumables supply, maintenance guidance and remote operational clarification.

PROJECT INQUIRY

Tell us about
your water.

Send your water analysis, target capacity and application. Konche will help select and configure the suitable system.

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